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AMRI Facilities
and Resources
The AMRI research laboratories are located in the
Science Building at the University of New Orleans, where it occupies more
than 10,000 square feet of office and laboratory space, including a
640 square foot Class 100 Clean Room, and has available an inventory of
more than $9.5 million of specialized materials research instrumentation
to carry out its research programs.
The majority of our research is conducted at our AMRI
facilities by scientists and post-doctoral researchers who are developing
and working on their research programs. Some components of the research
are conducted in the laboratories of the participating universities, who
are part of a research consortium established by AMRI through its research
projects.
Instrumentation currently in place and available to
AMRI researchers include:
Structural
Characterization
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Transmission
Electron Microscope (TEM), JEOL Model 2010 with energy dispersive
X-ray spectrometer (EDS).
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Scanning
Electron Microscope (SEM), JEOL Model 5410 with energy dispersive
X-ray spectrometer (EDS).
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Field
Emission Scanning Electron Microscope (FESEM), Model LEO 1530VP,
variable pressure FESEM with EDS.
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Asylum
Research Atomic Force Microscope/Magnetic Force Microscope equipped
for piezoelectric measurements.
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Princeton
Instruments Trivista triple spectrometer (Raman, FTIR,
Photoluminescence).
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Pananalytical
Thin film/Small Angle X-Ray Diffraction (SAXS).
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Digital
Instruments NanoScope Multimode Scanning Probe Microscope with
combined atomic force microscopy, magnetic force microscopy and
scanning tunneling microscopy.
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VEECO
Scanning probe microscope.
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Philips
X’Pert X-ray powder diffractometer.
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BX51TRF
Microscope frame w/o TL arm w/2 sockets for patterning and wafer
checking.
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DEC
Alpha Workstation for EM image simulation, processing and storage.
Sensor
and Device Characterization
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Magneto-optical
characterization equipment: Oxford Instruments superconducting
magnet with optical access both parallel and perpendicular to the
magnetic field. The system is capable of producing fields up to
7 T and the sample temperature can be set anywhere from 2 K to 300 K
(-456°F to 80°F). A spectroscopic light source provides
monochromatic light in the spectral range from 200 nm to 1800 nm for
reflection and transmission measurements. Additionally, an Argon
ion laser is available as an excitation source for photoluminescence
measurements.
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Ocean
Optics Fiber UV-Vis Spectrometer
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Thermo
Nicolet NEXUS 670 FT-IR spectophotometer.
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Keithley
Model 2001 Digital Multimeter, Model 2400 Source Meter and Model 2182
Nanovoltmeter for precision I-V and tunneling current measurements.
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Quantum
Design Physical Properties Measurement System (PPMS) with 9 T
and 14 T magnet and 1.9K to 350K temperature range for Options
included: AC/DC magnetometer, AC transport, Torque magnetometer,
Electro-transport, Thermo-Electric.
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Quantum
Design MPMS-5S SQUID Susceptometer with 5.5 T magnet, 1.7K to 400K
temperature range and AC and DC capabilities.
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Quantum
Design MPMS-7XL SQUID Susceptometer with 7.0 T magnet, 1.7K to 1000K
temperature range and transverse measurement capabilities.
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High
temperature Hall effect measurement system with Lakeshore 370 AC
Resistance Bridge
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Ferromagnetic
Resonance (FMR) and Electron Paramagnetic Resonance (EPR) Spectrometer
System, Bruker EMX 10/12. Options included: X-band (9.8 GHz), Q-band
(35GHz), low temperature X-band (2 K-300 K), low temperature Q-band (2
K-300 K).
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Agilent
Vector Network Analyzer HP 8722ES, covering frequencies from 50 MHz to
40 GHz. Options included: Time Domain Capability, High Stability
Frequency Reference, Materials Measurement Software, and Fourth
Sampler and TRL calibration. Various broadband, microstrip and
waveguide test fixtures are available for our network analyzer.
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Cascade
Microtech Complete RF Measurement Package, including probe station
(Summit 9101 Analytical Probe Station), microscope (Leica S6E
StereoZoom microscope kit), Infinity Microwave and RF probes, cables,
positioners, calibration software, and accessories.
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Agilent
Impedance/Material Analyzer HP4291B frequency range (1 MHz to 1.8 GHz
with 10-3 Hz resolution). High Q accuracy enables low-loss component
analysis.
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Agilent
LCR meter HP4284A with dielectric test fixture (20 HZ – 1 MHz).
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Vector
Vibrating Sample Magnetometer from Lakeshore: 0-1T magnetic field
range, 4K-1273K temperature range. Options: Vector option (Y coils
set), cryostat, oven, low field (Helmholtz coil set).
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Ferroelectric
tester (already bought; Radiant Technologies) for measuring
ferroelectric and piezoelectric material.
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TA
Instruments - Thermal Analysis (DSC/TGA/DTA) System.
Materials Synthesis
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MBraun
Drybox.
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Two
Schlenk Lines.
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Shimadzu
Gas chromatograph/Mass Spectrometer.
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Crystal
Systems Corporation, Four-mirror optical floating zone furnace.
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Five
inert atmosphere glove boxes with air purification system.
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One
six port vacuum line for oxygen-free synthesis.
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Two
high temperature box furnaces (Lindberg/Blue M, Tmax = 1100
°C).
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One
high temperature tube furnaces (Lindberg/Blue M, Tmax =
1200 °C).
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Two
high temperature tube furnaces (Applied Test Systems; Tmax = 1100
°C).
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Four balances.
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Two laboratory dry ovens.
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Hot Press, Thermal Technology Inc. Model
HP20-4560-20.
Nanofabrication
of
Materials
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EG&G
VMP2Z multichannel potentiostat and a Princeton 273A
Potentiostat/Galvanostat for electrodeposition.
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Pulsed
Laser Ablation Deposition System, a Pulsed Excimer-500 Laser (Lumonics
Co.) operating at the wavelengths range from 155 to 780 nm.
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APX
Scientific Microlayer 400 sputtering systems (10-10 Torr
range) with six 3″ magnetron guns which
are in co-deposition configuration and can be operated in DC or RF
modes. The system has a potential of producing even very complex
nanowires structures.
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Four
Glove box Systems (Model VAC100029) for catalyst fabrication.
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Furnaces:
Eight Lindberg/Blue M box furnaces (1100˚C max.) and ten
Lindberg/Blue M tube furnaces (1100˚C max.) most with
programmable controllers; two Thermolyne tube furnaces (1200˚C
max.) with single set point controllers. Two vacuum ovens, one high
temperature (1500˚C max.) box furnace and one high temperature
(1500˚C max.) tube furnace.
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NAPCO
2028R Multi-Functional Centrifuge.
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Controlled
atmosphere dryboxes:
MBRaun two-person
dry box with moisture and oxygen sensors, hydraulic press, and video
microscope. Several VAC Atmospheres argon-filled drybox, one fitted
with an Illinois Instruments oxygen sensor.
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Controlled
atmosphere dryboxes: MBRaun
two-person dry box with moisture and oxygen sensors, hydraulic press,
and video microscope. Several VAC Atmospheres argon-filled drybox, one
fitted with an Illinois Instruments oxygen sensor.
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High
vacuum line for sealing glass tubes for annealing and synthesis.
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RPR-200
Rayonet UV Reactor System.
Patterning and Writing
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JC
Nabity Lithography Systems incorporated with LEO 1530 Field Emission
Scanning Microscope for e-beam nanowriting and nanopatterning.
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6708
Spin Coater with programmable logical control to store and execute
operator-selectable spin coat profile.
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LG-B
100B Mechanical Convention Ovens for ideal general drying,
conditioning, desiccating, annealing, moisture testing, aging, and
test.
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CRESSINTON
308R Vacuum sputter and evaporator with thickness control.
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Denton
Desk II cold sputter/etch unit and carbon evaporation accessory.
Nanoscale Component Fabrication
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Four
Glove Box Systems (Model VAC100029) for nanoparticle fabrication.
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Furnaces:
Eight Lindberg Tube Furnaces box furnaces (1100°C) and ten
Lindberg/Blue M tube furnaces (1100°C) max. One high temperature
furnace (1600°C).
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Pulsed
laser deposition system. The neodymium-doped yttrium aluminum garnet
(Nd:YAG) laser was used to evaporate the target materials. The laser
wavelength, energy density, and pulse frequency were 266 nm, 2 J/cm2,
and 2 Hz, respectively.
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Chemical
Vapor Deposition (CVD) system for nanowire synthesis.
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EG&VMP2Z
multichannel potentiostat and a Princeton 273A Potentiostat
/Galvanostat for electrodeposition.
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NaPCO
2028R Muti-Functional Centrifuge.
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Controlled
atmosphere dryboxes:
MBRaun
two-person dry box with moisture and oxygen sensors, hydraulic press,
and video microscope.
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RPR-200
Rayonet UV Reactor System.
Sensor Chip Assembly and Fabrication
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UV
light pattern generator for photolithography.
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JC
Nabity Lithography Systems incorporated with LEO 1530 Field Emission
Scanning Microscope for e-beam nanowriting and nanopatterning.
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KSV
5000 Langmuir-Blodgett (LB) Alignment Equipment with computer control
for surface tension measurement.
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6708
Spin Coater with programmable logical control to store and execute
operator-selectable spin coat profile.
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LG-B
100B Mechanical Convention Ovens for ideal general drying,
conditioning, desiccating, annealing, moisture testing, aging, and
testing.
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308
EM Vacuum evaporator with thickness control.
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Kleindiek
Nanomanipulator System with four nanomanipulators, microgripper and
microinjections.
Transport Property Measurement for Sensor Chips
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Keithley
6585 Picoammeter for current measurement.
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Quantum
Design Physical Properties Measurement System (PPMS) with 9T magnet
and 1.9K to 350K temperature range for transportation, tunneling
effect and Hall effect, etc.
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Kleindiek
Nanomanipulator System with in-situ transportation measurement.
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Quantum
Design Physical Properties Measurement System (PPMS) (transport,
magnetostriction, magnetic, thermo-electric, and anisotropy
measurements,); wide range of temperature (2 K-400 K) and magnetic
field (0 T-14 T). Options included: AC/DC magnetometer, AC transport,
Torque magnetometer, Electro-transport, Thermo-Electric.
Modeling and Simulation
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AMRI
researchers are a part of the Louisiana Optical Network Initiative, or
LONI, which is a state-of-the-art, fiber optics network that runs
throughout Louisiana, and connects Louisiana and Mississippi research
universities to one another as well as National LambdaRail and
Internet2. LONI provides Louisiana researchers with one of the most
advanced optical networks in the country and the most powerful
distributed supercomputer resources available to any academic
community with over 85 teraflops of computational capacity.
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Hardware
includes a 14-node, 112-processor, IBM P5-575 system and a 128-node,
512-core Dell Xeon supercomputer which are installed in the University
Computing and Communications Center, and are part of the Louisiana
Optical Network (LONI).
Nanodevice
Processing Laboratory
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Clean
Room Facility (“Class 100”). This facility was developed to
provide research support for AMRI and collaborating institutions with
the cleanroom facilities and technology to do competitive research in
the field of nanofabrication. The evaluation of the purity of
the air is based on number of dust particles in a unit volume. Due to
this design the air is filtered several times before leaving the
cleanroom and the number of particles present in the unit volume
dropped to below 100, which elevates the rank of the cleanroom to
“Class 100”. Specialized equipment in the clean room
includes:
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Four
vertical flow benches.
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Particle
monitoring system.
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Spin-coater/hot
plate (Coat-bake) system, Model CEE 200CB.
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Mask
aligner/UV exposure station.
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Milling
system, Orion-8-IM.
Other
Resources
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Other smaller equipment items also are available
to AMRI researchers. These include arc induction furnaces, tube
furnaces, Schlenck and high vacuum lines, three VAC atmosphere
controlled glove boxes for wet and dry chemical synthesis, and a
variety of wet chemistry laboratory equipment. The Chemistry
Department at UNO manages a large instrumentation facility that houses
state-of-the-art NMR spectrometers (300, 400, and 500 MHz), mass
spectrometers (4 units, including Tandem MS and MALDI MS), and
UV-Vis-IR spectrometers, which also are available to AMRI researchers.
Also available to our researchers through the College of Sciences are
a machine shop, an electronics shop, and a glass shop for use as
needed on our projects.
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